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SEMulator3D 2008 release
This release of the SEMulator3D product family includes two separate products: SEMulator3D and MEMulator. SEMulator3D is ideal for modeling semiconductor fabrication processes, while MEMulator is ideal for modeling MEMS fabrication processes.
Faster Model Building and Loading
3D Model building times have been significantly improved (up to 30% of previous releases). Allowing you to build larger models of the latest technology nodes. In addition the loading time of completed models has been significantly improved by avoiding unneccesary redundancy.
Extended project data management
Several improvements have been made for managing project data. For example the 2D layer mapping data can now be obtained from EDA tech-files, Coventor Layout files or just a text file.
More data can be carried between projects and is saved with each model such as:
- Model data
- Camera and Camera-paths
- lighting effects
- cross-section paths for animation
Process and material data have been linked. The project can be set up to work from a central foundry specific material database or model specific database.
Semiconductor processing improvements
We keep adding new manufacturing process functions. In this new release we added mask-less (or hard mask) etching and arbitrary cross section fucntions. This allows for extreme accuracy of semiconductor process emulation.
Advanced programming
New API's will give the user access to the model building instruction set and model building results. This function gives advanced users the capability to connect SEMulator3D to external programs or allows them to run customized software programs while building models.
New Python modules
We've deliverd some advanced programming functions and examples through the new API's.
- Microsoft Excell reader/writer for tighter connection to the process travelers and special mathematical function definitions in 3D
- Matlab plotting functions
- Image library functions for lithography studies, labeling and many other functions
- For creating custom User Interfaces for parameter control
- Distance function definition that can be used to create exact curves measured on SEM photo graphs
Improved imaging
The quality of the output images has been improved allowing sub-nanometer model resolution model creation and viewing. We've also added a function to automatically create a full PowerPoint presentation of all the process steps with slide control to present the semiconductor processing to an audience.
Computational or Visualization GRID
In SEMulator3D the user can now generate Computational GRIDs and Visualization GRIDs. Even the most complext devices can now be connected to simulation tools and shared through Acrobat3D using this function giving you 3D models in PDF format.
 45 nm transistor
Almost all of the improvements listed above were used to create the 3D model shown here. This model is created by emulating the 45 nanometer process presented by Intel at the 2007 IEDM conference.
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